MEIS Analysis of Transition Metal Oxide Thin Films

The Medium Energy Ion Scattering (MEIS) Facility at the University of Huddersfield has been used to carry out a depth profile analysis of transition metal oxide (TMO) thin films.  These TMO thin films have been deposited onto substrates using a novel type of pulsed laser deposition known as plasma-enhanced pulsed laser deposition (PE-PLD).


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